The plasma decontamination method is an emerging dry processing technique. In this technology, highly reactive radicals and atoms suitable for selective reaction with contaminants on the surface are generated by plasma power, whereby the radioactive contaminants form volatile species and evaporate. In a fluorine plasma discharge, volatile fluorides are produced on the contaminated surface which is exposed to not only reactive fluorine atoms, but also energetic ions, electrons, and photons which greatly enhances the decontamination rate.